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管式A&P設(shè)備

管式A&P設(shè)備

AlO+SiN薄膜沉積。


設(shè)備名稱 Equipment Name

管式A&P設(shè)備  Horizontal PEALD (A&P)

設(shè)備型號 Equipment Model

PD-520L/PD-520MAX

設(shè)備用途 Equipment Application

AlO+SiN薄膜沉積。
AlO+SiN Thin-film Deposition.


技術(shù)特點(diǎn)  Features

1、原子層沉積工藝特性,成膜均勻性好。

Atomic layer deposition process, with better film uniformity.

2、同機(jī)臺或同管完成多層膜沉積,減少工藝環(huán)節(jié),有效提升良率、降低碎片率。
Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively.

3、自主研發(fā)液態(tài)源前驅(qū)體蒸氣輸送與前驅(qū)體快速切換技術(shù)。
Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology.

4、適應(yīng)不同前驅(qū)體、不同材料鈍化層沉積,工藝拓展空間大。
Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.


設(shè)備參數(shù)  Parameters